RF-Matching network
Matching network
Matching network(MN) efficiently supply devices with RF. Matching network
MN matches impedance between an RF generator and a plasma device. This process prevents the reflection from a plasma device. MN parts (air variable capacitors, geared motors etc.) have problems.
P.R.A. removes problems of MN, and makes DC motors more sensitive. As a result,
reproducibility of experiment process improves more than before.
Advantage
・Improve the specs of parts.
・Improve the repeatability of etching.
・Extend life span.
Catalog
Download
Please feel free to contact us if you have any problems with plasma.
